rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Glow discharge processes
    sub title: sputtering and plasma etching
  name:
    name part: Chapman, Brian
    role:
      role term: creator
  type of resource: text
  origin info:
    place:
      place term: us
    place:
      place term: New York
    publisher: John Wiley & Sons
    date issued: 1980
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: print
    extent: xv, 406 p. fig., tab. 24 cm
  table of contents: Includes appendix, references, index
  note: Brian Chapman
  subject:
    topic: Ηλεκτρισμός
  classification: 80-17047
  identifier: 047107828X
  location:
    physical location: GR-PaULI ΠΑΤΡΑ ΦΥΣΙΚΟ
  record info:
    record content source: GR-PaULI
    record creation date: 970423
    record change date: 20210117205859.0
    record identifier: 10024946