rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Growth and Transport in Nanostructured Materials
    sub title: Reactive Transport in PVD, CVD, and ALD
  name:
    name part: Yanguas-Gil, Angel.
    role:
      role term: creator
    role:
      role term: author.
  name:
    name part: SpringerLink (Online service)
  type of resource: text
  origin info:
    place:
      place term: gw
    date issued: 2017
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: electronic
    form: electronic resource
    reformatting quality: access
    form: remote
    extent: XI, 128 p. 57 illus., 20 illus. in color. online resource.
  abstract: This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those…
  table of contents: Introduction -- Fundamentals of Gas Phase Transport on Nanostructured Materials -- Modeling Thin Film Growth on Nanostructured Materials -- Advanced Concepts.
  note: by Angel Yanguas-Gil.
  subject:
    topic: Materials science
  subject:
    topic: Energy storage
  subject:
    topic: Nanochemistry
  subject:
    topic: Semiconductors
  subject:
    topic: Surfaces (Physics)
  subject:
    topic: Interfaces (Physical sciences)
  subject:
    topic: Thin films
  subject:
    topic: Materials
    topic: Surfaces
  subject:
    topic: Materials Science
  subject:
    topic: Surfaces and Interfaces, Thin Films
  subject:
    topic: Surface and Interface Science, Thin Films
  subject:
    topic: Nanochemistry
  subject:
    topic: Semiconductors
  subject:
    topic: Energy Storage
  classification: TA418.7-418.76
  classification: TA418.9.T45
  classification: 620.44
  related item:
    title info:
      title: Springer eBooks
  related item:
    title info:
      title: SpringerBriefs in Materials
  identifier: 9783319246727
  identifier: http://dx.doi.org/10.1007/978-3-319-24672-7
  record info:
    record creation date: 161130
    record change date: 20161130115331.0
    record identifier: 978-3-319-24672-7