rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Precursor Chemistry of Advanced Materials
  name:
    name part: Fischer, Roland A.
    role:
      role term: editor.
  name:
    name part: SpringerLink (Online service)
  type of resource: text
  origin info:
    place:
      place term: gw
    date issued: 2005
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: electronic
    form: electronic resource
    reformatting quality: access
    form: remote
    extent: XVII, 214 p. online resource.
  abstract: Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
  table of contents: M.D. Allendorf, A.M.B. van Mol: Gas-Phase Thermochemistry and Mechanism of Organometallic Tin Oxide CVD Precursors -- A. Devi, R.A. Fischer, J. Müller and R. Schmid: Materials Chemistry of Group-13 Nitrides -- M. Veith, S. Mathur: Single-Source-Precursor CVD: Alkoxy and Siloxy Aluminum Hydrides -- S. Schulz: CVD Deposition of Binary AlSb and GaSb Material Films - A Single-Source Approach -- M. Putkonen, L. Niinistö: Organometallic Precursors For Atomic Layer Deposition -- Ph. Serp, J.-C. Hierso and Ph. Kalck: Surface Reactivity of Transition Metal CVD Precursors: towards the Control of the Nucleation Step -- M.A. Malik and P. O'Brien: Organometallic and Metal-organic Precursors for Nanoparticles.
  note: edited by Roland A. Fischer.
  subject:
    topic: Chemistry
  subject:
    topic: Inorganic chemistry
  subject:
    topic: Organometallic chemistry
  subject:
    topic: Physical chemistry
  subject:
    topic: Materials science
  subject:
    topic: Chemistry
  subject:
    topic: Organometallic Chemistry
  subject:
    topic: Materials Science, general
  subject:
    topic: Inorganic Chemistry
  subject:
    topic: Physical Chemistry
  classification: QD410-412.5
  classification: 547.05
  related item:
    title info:
      title: Springer eBooks
  related item:
    title info:
      title: Topics in Organometallic Chemistry, 9
  identifier: 9783540314516
  identifier: http://dx.doi.org/10.1007/b75019
  record info:
    record creation date: 100806
    record change date: 20151204155731.0
    record identifier: 978-3-540-31451-6