rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Sputtering by Particle Bombardment
    sub title: Experiments and Computer Calculations from Threshold to MeV Energies
  name:
    name part: Behrisch, Rainer.
    role:
      role term: editor.
  name:
    name part: Eckstein, Wolfgang.
    role:
      role term: editor.
  name:
    name part: SpringerLink (Online service)
  type of resource: text
  origin info:
    place:
      place term: gw
    date issued: 2007
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: electronic
    form: electronic resource
    reformatting quality: access
    form: remote
    extent: XVII, 509 p. online resource.
  abstract: This volume gives a comprehensive overview about the physical processes causing sputtering of solids at bombardment with energetic ions. The most important quantities are the sputtering yields, i.e. the average number of atoms eroded per incident ion. The latest results for the sputtering yields and their dependence on the incident energy and angle of incidence, as well as the energy and angular distributions of the sputtered atoms are presented. This concerns experimentally determined yields as well as a critical evaluation of the computational methods used to calculate the yields and distributions. The energies of the incident ions cover the range between a few eV up to several MeV. The influence of chemical effects between the incident ions and the atoms of the bombarded solid on the sputtering yields are also reviewed.
  table of contents: and Overview -- Computer Simulation of the Sputtering Process -- Sputtering Yields -- Results of Molecular Dynamics Calculations -- Energy and Angular Distributions of Sputtered Species -- Chemical Sputtering -- Electronic Sputtering with Swift Heavy Ions.
  note: edited by Rainer Behrisch, Wolfgang Eckstein.
  subject:
    topic: Materials science
  subject:
    topic: Atoms
  subject:
    topic: Physics
  subject:
    topic: Matter
  subject:
    topic: Plasma (Ionized gases)
  subject:
    topic: Materials
    topic: Surfaces
  subject:
    topic: Thin films
  subject:
    topic: Materials Science
  subject:
    topic: Surfaces and Interfaces, Thin Films
  subject:
    topic: Atoms and Molecules in Strong Fields, Laser Matter Interaction
  subject:
    topic: Plasma Physics
  classification: TA418.7-418.76
  classification: TA418.9.T45
  classification: 620.44
  related item:
    title info:
      title: Springer eBooks
  related item:
    title info:
      title: Topics in Applied Physics, 110
  identifier: 9783540445029
  identifier: http://dx.doi.org/10.1007/978-3-540-44502-9
  record info:
    record creation date: 100301
    record change date: 20151204163257.0
    record identifier: 978-3-540-44502-9