rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
    sub title: A User-Oriented Guide
  name:
    name part: Hofmann, Siegfried.
    role:
      role term: creator
    role:
      role term: author.
  name:
    name part: SpringerLink (Online service)
  type of resource: text
  origin info:
    place:
      place term: gw
    date issued: 2013
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: electronic
    form: electronic resource
    reformatting quality: access
    form: remote
    extent: XX, 528 p. online resource.
  abstract: To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. .
  table of contents: Outline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples).
  note: by Siegfried Hofmann.
  subject:
    topic: Physics
  subject:
    topic: Solid state physics
  subject:
    topic: Spectroscopy
  subject:
    topic: Microscopy
  subject:
    topic: Materials
    topic: Surfaces
  subject:
    topic: Thin films
  subject:
    topic: Physics
  subject:
    topic: Solid State Physics
  subject:
    topic: Spectroscopy and Microscopy
  subject:
    topic: Surfaces and Interfaces, Thin Films
  classification: QC176-176.9
  classification: 530.41
  related item:
    title info:
      title: Springer eBooks
  related item:
    title info:
      title: Springer Series in Surface Sciences, 49
  identifier: 9783642273810
  identifier: http://dx.doi.org/10.1007/978-3-642-27381-0
  record info:
    record creation date: 121025
    record change date: 20151106081158.0
    record identifier: 978-3-642-27381-0