rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System
  name:
    name part: Samukawa, Seiji.
    role:
      role term: creator
    role:
      role term: author.
  name:
    name part: SpringerLink (Online service)
  type of resource: text
  origin info:
    place:
      place term: ja
    date issued: 2014
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: electronic
    form: electronic resource
    reformatting quality: access
    form: remote
    extent: VIII, 40 p. 35 illus., 30 illus. in color. online resource.
  abstract: This book provides for the first time a good understanding of the etching profile technologies that do not disturb the plasma. Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data. Readers are made familiar with these sensors, which can measure real plasma process surface conditions such as defect generations due to UV-irradiation, ion flight direction due to charge-up voltage in high-aspect ratio structures and ion sheath conditions at the plasma/surface interface. The plasma etching profile realistically predicted by a computer simulation based on output data from these sensors is described.
  table of contents: Introduction -- On-wafer UV sensor and prediction of UV irradiation damage -- Prediction of Abnormal Etching Profiles in High-aspect-ratio Via/Hole Etching Using On-wafer Monitoring System -- Feature Profile Evolution in Plasma Processing Using Wireless On-wafer Monitoring System.
  note: by Seiji Samukawa.
  subject:
    topic: Engineering
  subject:
    topic: Plasma (Ionized gases)
  subject:
    topic: Nanoscale science
  subject:
    topic: Nanoscience
  subject:
    topic: Nanostructures
  subject:
    topic: Semiconductors
  subject:
    topic: Nanotechnology
  subject:
    topic: Engineering
  subject:
    topic: Nanotechnology and Microengineering
  subject:
    topic: Nanoscale Science and Technology
  subject:
    topic: Nanotechnology
  subject:
    topic: Plasma Physics
  subject:
    topic: Semiconductors
  classification: T174.7
  classification: 620.5
  related item:
    title info:
      title: Springer eBooks
  related item:
    title info:
      title: SpringerBriefs in Applied Sciences and Technology
  identifier: 9784431547952
  identifier: http://dx.doi.org/10.1007/978-4-431-54795-2
  record info:
    record creation date: 140128
    record change date: 20151031031112.0
    record identifier: 978-4-431-54795-2