rdf-syntax-grammar
mods:
  schema location: http://www.loc.gov/mods/v3 http://www.loc.gov/standards/mods/v3/mods-3-2.xsd
  title info:
    title: Microstructured devices for chemical processing
  name:
    name part: Kashid, Madhvanand N.
    role:
      role term: creator
    role:
      role term: author.
  name:
    name part: Renken, Albert
    name part: 1941-
    role:
      role term: author.
  name:
    name part: Kiwi-Minsker, Lioubov
    role:
      role term: author.
  type of resource: text
  genre: bibliography
  genre: Electronic books.
  origin info:
    place:
      place term: gw
    date issued: 2014
    copyright date: 2014
    issuance: monographic
  language:
    language term: eng
  physical description:
    form: remote
    extent: 1 online resource (381 pages) : illustrations
  abstract: Based on courses taught by the authors, this advanced textbook discusses opportunities for achieving larger-scale reactions in a technically controllable, sustainable, cost-effective and safe manner. Adopting a practical approach, it describes how miniaturized devices are used successfully for process intensification, focusing on the engineering aspects of microstructured devices, such as their design and characterization for homogeneous and multiphase reactions. It addresses the conditions under which microstructured devices are beneficial, how they should be designed, and how such devices c.
  table of contents: Microstructured Devices for Chemical Processing; Contents; Preface; List of Symbols; Chapter 1 Overview of Micro Reaction Engineering; 1.1 Introduction; 1.2 What are Microstructured Devices?; 1.3 Advantages of Microstructured Devices; 1.3.1 Enhancement of Transfer Rates; 1.3.2 Enhanced Process Safety; 1.3.3 Novel Operating Window; 1.3.4 Numbering-Up Instead of Scale-Up; 1.4 Materials and Methods for Fabrication of Microstructured Devices; 1.5 Applications of Microstructured Devices; 1.5.1 Microstructured Reactors as Research Tool; 1.5.2 Industrial/Commercial Applications
  table of contents: 1.6 Structure of the Book1.7 Summary; References; Chapter 2 Basis of Chemical Reactor Design and Engineering; 2.1 Mass and Energy Balance; 2.2 Formal Kinetics of Homogenous Reactions; 2.2.1 Formal Kinetics of Single Homogenous Reactions; 2.2.2 Formal Kinetics of Multiple Homogenous Reactions; 2.2.3 Reaction Mechanism; 2.2.4 Homogenous Catalytic Reactions; 2.3 Ideal Reactors and Their Design Equations; 2.3.1 Performance Parameters; 2.3.2 Batch Wise-Operated Stirred Tank Reactor (BSTR); 2.3.3 Continuous Stirred Tank Reactor (CSTR); 2.3.4 Plug Flow or Ideal Tubular Reactor (PFR)
  table of contents: 2.4 Homogenous Catalytic Reactions in Biphasic Systems2.5 Heterogenous Catalytic Reactions; 2.5.1 Rate Equations for Intrinsic Surface Reactions; 2.5.1.1 The Langmuir Adsorption Isotherms; 2.5.1.2 Basic Kinetic Models of Catalytic Heterogenous Reactions; 2.5.2 Deactivation of Heterogenous Catalysts; 2.6 Mass and Heat Transfer Effects on Heterogenous Catalytic Reactions; 2.6.1 External Mass and Heat Transfer; 2.6.1.1 Isothermal Pellet; 2.6.2 Internal Mass and Heat Transfer; 2.6.2.1 Isothermal Pellet; 2.6.2.2 Nonisothermal Pellet
  table of contents: 2.6.2.3 Combination of External and Internal Transfer Resistances2.6.2.4 Internal and External Mass Transport in Isothermal Pellets; 2.6.2.5 The Temperature Dependence of the Effective Reaction Rate; 2.6.2.6 External and Internal Temperature Gradient; 2.6.3 Criteria for the Estimation of Transport Effects; 2.7 Summary; 2.8 List of Symbols; References; Chapter 3 Real Reactors and Residence Time Distribution (RTD); 3.1 Nonideal Flow Pattern and Definition of RTD; 3.2 Experimental Determination of RTD in Flow Reactors; 3.2.1 Step Function Stimulus-Response Method
  table of contents: 3.2.2 Pulse Function Stimulus-Response Method3.3 RTD in Ideal Homogenous Reactors; 3.3.1 Ideal Plug Flow Reactor; 3.3.2 Ideal Continuously Operated Stirred Tank Reactor (CSTR); 3.3.3 Cascade of Ideal CSTR; 3.4 RTD in Nonideal Homogeneous Reactors; 3.4.1 Laminar Flow Tubular Reactors; 3.4.2 RTD Models for Real Reactors; 3.4.2.1 Tanks in Series Model; 3.4.2.2 Dispersion Model; 3.4.3 Estimation of RTD in Tubular Reactors; 3.5 Influence of RTD on the Reactor Performance; 3.5.1 Performance Estimation Based on Measured RTD; 3.5.2 Performance Estimation Based on RTD Models; 3.5.2.1 Dispersion Model
  note: Madhvanand N. Kashid, Albert Renken, and Lioubov Kiwi-Minsker.
  note: Includes bibliographical references at the end of each chapters and index.
  subject:
    topic: Chemical processes
    topic: Study and teaching
  subject:
    topic: Chemical processes -- Study and teaching
  subject:
    topic: Engineering
  subject:
    topic: Microstructured devices
  classification: TP155.7 .K374 2014eb
  classification: 660.28
  related item:
    title info:
      title: Microstructured devices for chemical processing
    name:
      name part: Kashid, Madhvanand N.
    origin info:
      publisher: Weinheim, Germany : Wiley-VCH, ©2014
    physical description:
      extent: xix, 358 pages
  identifier: 9783527685196
  identifier: 3527685197
  identifier: 9783527685226
  identifier: 3527685227
  identifier: 9783527331284
  identifier: 9783527685189
  identifier: 9783527685233
  identifier: 352733128X
  identifier: 3527685189 (ePub)
  identifier: 9783527685189 (ePub)
  identifier: 3527685235 (Mobi)
  identifier: 9783527685233 (Mobi)
  identifier: https://doi.org/10.1002/9783527685226
  record info:
    record content source: E7B
    record creation date: 140910
    record change date: 20170124071446.8
    record identifier: ocn891386196
    language of cataloging:
      language term: eng