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10024946 |
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upatras |
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20210117205859.0 |
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970423s1980 us eng |
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|a eng
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4 |
|a 80-17047
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1 |
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|a Chapman, Brian
|9 151121
|
| 245 |
1 |
0 |
|a Glow discharge processes
|b sputtering and plasma etching
|c Brian Chapman
|
| 260 |
|
|
|a New York
|b John Wiley & Sons
|c 1980
|
| 300 |
|
|
|a xv, 406 p.
|b fig., tab.
|c 24 cm
|
| 505 |
1 |
|
|a Includes appendix, references, index
|
| 650 |
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4 |
|a Ηλεκτρισμός
|9 3230
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| 852 |
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