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| LEADER |
00874nam a2200241 u 4500 |
| 001 |
10024946 |
| 003 |
upatras |
| 005 |
20210117205859.0 |
| 008 |
970423s1980 us eng |
| 020 |
|
|
|a 047107828X
|q (Πανόδετο)
|
| 040 |
|
|
|a GR-PaULI
|c GR-PaULI
|
| 041 |
0 |
|
|a eng
|
| 050 |
|
4 |
|a 80-17047
|
| 100 |
1 |
|
|a Chapman, Brian
|9 151121
|
| 245 |
1 |
0 |
|a Glow discharge processes
|b sputtering and plasma etching
|c Brian Chapman
|
| 260 |
|
|
|a New York
|b John Wiley & Sons
|c 1980
|
| 300 |
|
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|a xv, 406 p.
|b fig., tab.
|c 24 cm
|
| 505 |
1 |
|
|a Includes appendix, references, index
|
| 650 |
|
4 |
|a Ηλεκτρισμός
|9 3230
|
| 852 |
|
|
|a GR-PaULI
|b ΠΑΤΡΑ
|b ΦΥΣΙΚΟ
|k ΑΕΧ-1
|h 537.52 CHA
|m 02029
|t 1
|
| 942 |
|
|
|2 ddc
|c BK15
|
| 999 |
|
|
|c 119204
|d 119204
|
| 952 |
|
|
|0 0
|1 0
|4 0
|6 537_520000000000000_CHA
|7 0
|9 194370
|a PHYS
|b PHYS
|d 2016-04-24
|i 02029
|l 0
|o 537.52 CHA
|r 2016-04-24
|t 1
|w 2016-04-24
|y BK15
|
