Diamond films chemical vapor deposition for oriented and heteroepitaxial growth

• Κύριος συγγραφέας: Kobashi, Koji
• Συγγραφή απο Οργανισμό/Αρχή: ScienceDirect (Online service)
• Μορφή: Ηλεκτρονική πηγή Βιβλίο
• Γλώσσα: English
• Έκδοση: Amsterdam ; London Elsevier 2005
• Έκδοση: 1st ed
• Θέματα: Diamonds, Artificial; Diamond thin films

<li>Discusses the most advanced techniques for diamond growth</li> <li>Assists diamond researchers in deciding on the most suitable process conditions</li> <li>Inspires readers to devise new CVD (chemical vapor deposition</li> Ever since the early 1980s, and the d...

Πίνακας περιεχομένων:

• 1. Overview of Oriented Growth
• 2. Diamond - Structure and CVD Growth
• 3. Microwave Plasma CVD Reactors
• 4. Other CVD Reactors
• 5. Crystal Orientations and Film Surface Morphology
• 6. Formation of Twins
• 7. Homoepitaxial Growth
• 8. Surface Reconstruction
• 9. Epitaxial Growth on cBN, Ni, and Other Substrates
• 10. Diamond Nucleation
• 11. HOD Film Growth
• 12. Oriented Growth on Noble Metals
• 13. Properties and Applications of Heteroepitaxial Diamond Films
• 14. Conclusion
• APPENDICES
• <li>Notations and units</li>
• <li>Plasma</li>
• <li>Properties of diamond and other semiconducting materials</li>
• <li>Reconstruction of diamond surfaces</li>
• <li>Materials constants</li>
• <li>Phase diagrams of carbon and metals</li>
• <li>Carbon solubilities in metals</li>
• <li>Biasing and growth conditions for diamond growth</li>