Evolution of Thin Film Morphology Modeling and Simulations /

Thin film deposition is the most ubiquitous and critical of the processes used to manufacture high tech devices. Morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties. This book focuses on modeling and simulations used in research on the mor...

Πλήρης περιγραφή

Λεπτομέρειες βιβλιογραφικής εγγραφής
Κύριοι συγγραφείς: Pelliccione, Matthew (Συγγραφέας), Lu, Toh-Ming (Συγγραφέας)
Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: New York, NY : Springer New York, 2008.
Σειρά:Materials Science, 108
Θέματα:
Διαθέσιμο Online:Full Text via HEAL-Link
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100 1 |a Pelliccione, Matthew.  |e author. 
245 1 0 |a Evolution of Thin Film Morphology  |h [electronic resource] :  |b Modeling and Simulations /  |c by Matthew Pelliccione, Toh-Ming Lu. 
264 1 |a New York, NY :  |b Springer New York,  |c 2008. 
300 |a XII, 206 p.  |b online resource. 
336 |a text  |b txt  |2 rdacontent 
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490 1 |a Materials Science,  |x 0933-033X ;  |v 108 
505 0 |a Description of Thin Film Morphology -- Surface Statistics -- Self-Affine Surfaces -- Mounded Surfaces -- Continuum Surface Growth Models -- Stochastic Growth Equations -- Small World Growth Model -- Discrete Surface Growth Models -- Monte Carlo Simulations -- Solid-on-Solid Models -- Ballistic Aggregation Models -- Concluding Remarks. 
520 |a Thin film deposition is the most ubiquitous and critical of the processes used to manufacture high tech devices. Morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties. This book focuses on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem both through numerical calculations based on Langevin continuum equations, and through Monte Carlo simulations based on discrete surface growth models when an analytical formulism is not convenient. Evolution of Thin-Film Morphology will be of benefit to university researchers and industrial scientists working in the areas of semiconductor processing, optical coating, plasma etching, patterning, micro-machining, polishing, tribology, and any discipline that requires an understanding of thin film growth processes. In particular, the reader will be introduced to the mathematical tools that are available to describe such a complex problem, and appreciate the utility of the various modeling methods through numerous example discussions. For beginners in the field, the text is written assuming a minimal background in mathematics and computer programming. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. 
650 0 |a Materials science. 
650 0 |a Optical materials. 
650 0 |a Electronic materials. 
650 0 |a Tribology. 
650 0 |a Corrosion and anti-corrosives. 
650 0 |a Coatings. 
650 0 |a Materials  |x Surfaces. 
650 0 |a Thin films. 
650 1 4 |a Materials Science. 
650 2 4 |a Surfaces and Interfaces, Thin Films. 
650 2 4 |a Optical and Electronic Materials. 
650 2 4 |a Tribology, Corrosion and Coatings. 
700 1 |a Lu, Toh-Ming.  |e author. 
710 2 |a SpringerLink (Online service) 
773 0 |t Springer eBooks 
776 0 8 |i Printed edition:  |z 9780387751085 
830 0 |a Materials Science,  |x 0933-033X ;  |v 108 
856 4 0 |u http://dx.doi.org/10.1007/978-0-387-75109-2  |z Full Text via HEAL-Link 
912 |a ZDB-2-CMS 
950 |a Chemistry and Materials Science (Springer-11644)