Materials Fundamentals of Gate Dielectrics

• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Άλλοι συγγραφείς: Demkov, Alexander A. (Επιμελητής έκδοσης), Navrotsky, Alexandra (Επιμελητής έκδοσης)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Dordrecht : Springer Netherlands, 2005.
• Θέματα: Physics.; Physical chemistry.; Electrical engineering.; Optical materials.; Electronic materials.; Physics, general.; Physical Chemistry.; Optical and Electronic Materials.; Electrical Engineering.

This book presents materials fundamentals of novel gate dielectrics that are being introduced into semiconductor manufacturing to ensure the continuous scalling of the CMOS devices. This is a very fast evolving field of research so we choose to focus on the basic understanding of the structure, ther...

Πίνακας περιεχομένων:

• Materials and Physical Properties of High-K Oxide Films
• Device Principles of High-K Dielectrics
• Thermodynamics of Oxide Systems Relevant to Alternative Gate Dielectrics
• Electronic Structure and Chemical Bonding in High-k Transition Metal and Lanthanide Series Rare Earth Alternative Gate Dielectrics: Applications to Direct Tunneling and Defects at Dielectric Interfaces
• Atomic Structure, Interfaces and Defects of High Dielectric Constant Gate Oxides
• Dielectric Properties of Simple and Complex Oxides from First Principles
• IVb Transition Metal Oxides and Silicates: An Ab Initio Study
• The Interface Phase and Dielectric Physics for Crystalline Oxides on Semiconductors
• Interfacial Properties of Epitaxial Oxide/Semiconductor Systems
• Functional Structures
• Mechanistic Studies of Dielectric Growth on Silicon
• Methodology for Development of High-? Stacked Gate Dielectrics on III–V Semiconductors.