Defects in High-k Gate Dielectric Stacks Nano-Electronic Semiconductor Devices /
The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced hig...
| Συγγραφή απο Οργανισμό/Αρχή: | |
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| Άλλοι συγγραφείς: | |
| Μορφή: | Ηλεκτρονική πηγή Ηλ. βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
Dordrecht :
Springer Netherlands,
2006.
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| Σειρά: | NATO Science Series II: Mathematics, Physics and Chemistry,
220 |
| Θέματα: | |
| Διαθέσιμο Online: | Full Text via HEAL-Link |
