Charged Semiconductor Defects Structure, Thermodynamics and Diffusion /

The technologically useful properties of a solid often depend upon the types and concentrations of the defects it contains. Not surprisingly, defects in semiconductors have been studied for many years, in many cases with a view towards controlling their behavior through various forms of "defect...

Πλήρης περιγραφή

Λεπτομέρειες βιβλιογραφικής εγγραφής
Κύριοι συγγραφείς: Seebauer, Edmund G. (Συγγραφέας), Kratzer, Meredith C. (Συγγραφέας)
Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: London : Springer London, 2009.
Σειρά:Engineering Materials and Processes,
Θέματα:
Διαθέσιμο Online:Full Text via HEAL-Link
LEADER 03850nam a22006375i 4500
001 978-1-84882-059-3
003 DE-He213
005 20151204164556.0
007 cr nn 008mamaa
008 100301s2009 xxk| s |||| 0|eng d
020 |a 9781848820593  |9 978-1-84882-059-3 
024 7 |a 10.1007/978-1-84882-059-3  |2 doi 
040 |d GrThAP 
050 4 |a QC176-176.9 
072 7 |a PNFS  |2 bicssc 
072 7 |a SCI077000  |2 bisacsh 
082 0 4 |a 530.41  |2 23 
100 1 |a Seebauer, Edmund G.  |e author. 
245 1 0 |a Charged Semiconductor Defects  |h [electronic resource] :  |b Structure, Thermodynamics and Diffusion /  |c by Edmund G. Seebauer, Meredith C. Kratzer. 
264 1 |a London :  |b Springer London,  |c 2009. 
300 |a XIV, 298 p.  |b online resource. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
347 |a text file  |b PDF  |2 rda 
490 1 |a Engineering Materials and Processes,  |x 1619-0181 
505 0 |a Fundamentals of Defect Ionization and Transport -- Experimental and Computational Characterization -- Trends in Charged Defect Behavior -- Intrinsic Defects: Structure -- Intrinsic Defects: Ionization Thermodynamics -- Intrinsic Defects: Diffusion -- Extrinsic Defects. 
520 |a The technologically useful properties of a solid often depend upon the types and concentrations of the defects it contains. Not surprisingly, defects in semiconductors have been studied for many years, in many cases with a view towards controlling their behavior through various forms of "defect engineering." For example, in the bulk, charging significantly affects the total concentration of defects that are available to mediate phenomena such as solid-state diffusion. Surface defects play an important role in mediating surface mass transport during high temperature processing steps such as epitaxial film deposition, diffusional smoothing in reflow, and nanostructure formation in memory device fabrication. Charged Semiconductor Defects details the current state of knowledge regarding the properties of the ionized defects that can affect the behavior of advanced transistors, photo-active devices, catalysts, and sensors. Features: Group IV, III-V, and oxide semiconductors; Intrinsic and extrinsic defects; and, Point defects, as well as defect pairs, complexes and clusters. A crucial reference for materials scientists, surface scientists, electrical engineers, and solid-state physicists looking to approach the topic of defect charging from an integrated chemical engineering perspective. Researchers and industrial practitioners alike will find its content invaluable for device and process optimization. 
650 0 |a Physics. 
650 0 |a Solid state physics. 
650 0 |a Spectroscopy. 
650 0 |a Microscopy. 
650 0 |a Thermodynamics. 
650 0 |a Heat engineering. 
650 0 |a Heat transfer. 
650 0 |a Mass transfer. 
650 0 |a Continuum mechanics. 
650 0 |a Electronics. 
650 0 |a Microelectronics. 
650 0 |a Optical materials. 
650 0 |a Electronic materials. 
650 1 4 |a Physics. 
650 2 4 |a Solid State Physics. 
650 2 4 |a Spectroscopy and Microscopy. 
650 2 4 |a Optical and Electronic Materials. 
650 2 4 |a Continuum Mechanics and Mechanics of Materials. 
650 2 4 |a Electronics and Microelectronics, Instrumentation. 
650 2 4 |a Engineering Thermodynamics, Heat and Mass Transfer. 
700 1 |a Kratzer, Meredith C.  |e author. 
710 2 |a SpringerLink (Online service) 
773 0 |t Springer eBooks 
776 0 8 |i Printed edition:  |z 9781848820586 
830 0 |a Engineering Materials and Processes,  |x 1619-0181 
856 4 0 |u http://dx.doi.org/10.1007/978-1-84882-059-3  |z Full Text via HEAL-Link 
912 |a ZDB-2-PHA 
950 |a Physics and Astronomy (Springer-11651)