Design for Manufacturability with Advanced Lithography

• Κύριοι συγγραφείς: Yu, Bei (Συγγραφέας), Pan, David Z. (Συγγραφέας)
• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Cham : Springer International Publishing : Imprint: Springer, 2016.
• Έκδοση: 1st ed. 2016.
• Θέματα: Engineering.; Microprocessors.; Electronics.; Microelectronics.; Electronic circuits.; Circuits and Systems.; Processor Architectures.; Electronics and Microelectronics, Instrumentation.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...

Πίνακας περιεχομένων:

• Introduction
• Layout Decomposition for Triple Patterning
• Layout Decomposition for Other Patterning Techniques
• Standard Cell Compliance and Placement Co-Optimization
• Design for Manufacturability with E-Beam Lithography
• Conclusions and Future Works.-.