Design for Manufacturability with Advanced Lithography

• Main Authors: Yu, Bei (Author), Pan, David Z. (Author)
• Corporate Author: SpringerLink (Online service)
• Format: Electronic eBook
• Language: English
• Published: Cham : Springer International Publishing : Imprint: Springer, 2016.
• Edition: 1st ed. 2016.
• Subjects: Engineering.; Microprocessors.; Electronics.; Microelectronics.; Electronic circuits.; Circuits and Systems.; Processor Architectures.; Electronics and Microelectronics, Instrumentation.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...

Table of Contents:

• Introduction
• Layout Decomposition for Triple Patterning
• Layout Decomposition for Other Patterning Techniques
• Standard Cell Compliance and Placement Co-Optimization
• Design for Manufacturability with E-Beam Lithography
• Conclusions and Future Works.-.