Design for Manufacturability with Advanced Lithography

Design for Manufacturability with Advanced Lithography

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufactur...

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Bibliographic Details
Main Authors: Yu, Bei (Author), Pan, David Z. (Author)
Corporate Author: SpringerLink (Online service)
Format: Electronic eBook
Language:English
Published: Cham : Springer International Publishing : Imprint: Springer, 2016.
Edition:1st ed. 2016.
Subjects:
Engineering.
Microprocessors.
Electronics.
Microelectronics.
Electronic circuits.
Circuits and Systems.
Processor Architectures.
Electronics and Microelectronics, Instrumentation.
Online Access:Full Text via HEAL-Link

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ΒΚΠ - Πατρα: ALFd

Holdings details from ΒΚΠ - Πατρα: ALFd
Call Number: 330.01 BAU
Copy 1 Available

ΒΚΠ - Πατρα: BSC

Holdings details from ΒΚΠ - Πατρα: BSC
Call Number: 330.01 BAU
Copy 2 Available
Copy 3 Available

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