Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means...
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| Format: | Electronic eBook |
| Language: | English |
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Cham :
Springer International Publishing : Imprint: Springer,
2017.
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| Series: | Springer Theses, Recognizing Outstanding Ph.D. Research,
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| Online Access: | Full Text via HEAL-Link |
Table of Contents:
- Introduction
- Fabrication Techniques
- Characterization Techniques
- Thermal Oxidation of Gd2o3
- Plasma Oxidation of Gd2o3 and Sc2o3
- Gadolinium Scandate
- Interface Scavenging
- Gd2o3 on Inp Substrates
- Conclusions and Future Work.