Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets

• Κύριος συγγραφέας: Pampillón Arce, María Ángela (Συγγραφέας)
• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Cham : Springer International Publishing : Imprint: Springer, 2017.
• Σειρά: Springer Theses, Recognizing Outstanding Ph.D. Research,
• Θέματα: Physics.; Surfaces (Physics).; Interfaces (Physical sciences).; Thin films.; Electronic circuits.; Nanotechnology.; Surface and Interface Science, Thin Films.; Electronic Circuits and Devices.; Nanotechnology and Microengineering.

This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means...

Πίνακας περιεχομένων:

• Introduction
• Fabrication Techniques
• Characterization Techniques
• Thermal Oxidation of Gd2o3
• Plasma Oxidation of Gd2o3 and Sc2o3
• Gadolinium Scandate
• Interface Scavenging
• Gd2o3 on Inp Substrates
• Conclusions and Future Work.