Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

• Κύριοι συγγραφείς: Shim, Seongbo (Συγγραφέας, http://id.loc.gov/vocabulary/relators/aut), Shin, Youngsoo (http://id.loc.gov/vocabulary/relators/aut)
• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Cham : Springer International Publishing : Imprint: Springer, 2018.
• Έκδοση: 1st ed. 2018.
• Σειρά: NanoScience and Technology,
• Θέματα: Nanotechnology.; Electronic circuits.; Optical materials.; Electronic materials.; Nanoscale science.; Nanoscience.; Nanostructures.; Semiconductors.; Nanotechnology and Microengineering.; Circuits and Systems.; Optical and Electronic Materials.; Nanoscale Science and Technology.
• Φυσική περιγραφή: XIV, 138 p. 92 illus., 54 illus. in color. online resource.
• ISBN: 9783319762944
• ISSN: 1434-4904
• DOI: 10.1007/978-3-319-76294-4

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.