Metal Impurities in Silicon- and Germanium-Based Technologies Origin, Characterization, Control, and Device Impact /

• Κύριοι συγγραφείς: Claeys, Cor (Συγγραφέας, http://id.loc.gov/vocabulary/relators/aut), Simoen, Eddy (http://id.loc.gov/vocabulary/relators/aut)
• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Cham : Springer International Publishing : Imprint: Springer, 2018.
• Έκδοση: 1st ed. 2018.
• Σειρά: Springer Series in Materials Science, 270
• Θέματα: Optical materials.; Electronic materials.; Microwaves.; Optical engineering.; Semiconductors.; Electronic circuits.; Materials science.; Optical and Electronic Materials.; Microwaves, RF and Optical Engineering.; Electronic Circuits and Devices.; Characterization and Evaluation of Materials.

 This book gives a unique review of different aspects of metallic contaminations in Si and Ge-based semiconductors. All important metals are discussed including their origin during crystal and/or device manufacturing, their fundamental properties, their characterization techniques and their impact on the electrical device performance. Several control and possible gettering approaches are addressed. The book is a reference for researchers and engineers studying advanced and state-of-the-art micro- and nano-electronic semiconductor devices and circuits. It has an interdisciplinary nature by combining different disciplines such as material science, defect engineering, device processing, defect and device characterization and device physics and engineering. 

 Preface -- Introduction -- Basic Properties of Metals in Semiconductors -- Sources of Metals in Si and Ge Processing -- Characterization and Detection of Metals in Silicon and Germanium -- Electrical Activity of Metals in Si and Ge -- Impact of Metals on Silicon Devices and Circuits -- Gettering and Passivation of Metals in Silicon and Germanium -- Modeling and Simulation of Metals in Silicon and Germanium -- Conclusions.