High Dielectric Constant Materials VLSI MOSFET Applications /
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...
Συγγραφή απο Οργανισμό/Αρχή: | SpringerLink (Online service) |
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Άλλοι συγγραφείς: | Huff, H.R (Επιμελητής έκδοσης), Gilmer, D.C (Επιμελητής έκδοσης) |
Μορφή: | Ηλεκτρονική πηγή Ηλ. βιβλίο |
Γλώσσα: | English |
Έκδοση: |
Berlin, Heidelberg :
Springer Berlin Heidelberg,
2005.
|
Σειρά: | Springer Series in Advanced Microelectronics,
16 |
Θέματα: | |
Διαθέσιμο Online: | Full Text via HEAL-Link |
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