High Dielectric Constant Materials VLSI MOSFET Applications /
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...
Corporate Author: | SpringerLink (Online service) |
---|---|
Other Authors: | Huff, H.R (Editor), Gilmer, D.C (Editor) |
Format: | Electronic eBook |
Language: | English |
Published: |
Berlin, Heidelberg :
Springer Berlin Heidelberg,
2005.
|
Series: | Springer Series in Advanced Microelectronics,
16 |
Subjects: | |
Online Access: | Full Text via HEAL-Link |
Similar Items
-
Plasmonics: Fundamentals and Applications
by: Maier, Stefan A.
Published: (2007) -
High Dielectric Constant Materials VLSI MOSFET Applications
by: Huff, H.R
Published: (2005) -
Quantum Dots: Fundamentals, Applications, and Frontiers Proceedings of the NATO Advanced Research Workshop on Quantum Dots: Fundamentals, Applications and Frontiers Crete, Greece, 20–24 July 2003 /
Published: (2005) -
Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials Proceedings of the NATO Advanced Study Institute on Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials Algarve, Portugal 1–13 October 2002 /
Published: (2005) -
Rare Earth Oxide Thin Films
Published: (2007)