High Dielectric Constant Materials VLSI MOSFET Applications /
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...
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Other Authors: | , |
Format: | Electronic eBook |
Language: | English |
Published: |
Berlin, Heidelberg :
Springer Berlin Heidelberg,
2005.
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Series: | Springer Series in Advanced Microelectronics,
16 |
Subjects: | |
Online Access: | Full Text via HEAL-Link |
Internet
Full Text via HEAL-LinkΒΚΠ - Πατρα: ALFd
Call Number: |
330.01 BAU |
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Copy 1 | Available |
ΒΚΠ - Πατρα: BSC
Call Number: |
330.01 BAU |
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Copy 2 | Available |
Copy 3 | Available |