High Dielectric Constant Materials VLSI MOSFET Applications /

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their i...

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Bibliographic Details
Corporate Author: SpringerLink (Online service)
Other Authors: Huff, H.R (Editor), Gilmer, D.C (Editor)
Format: Electronic eBook
Language:English
Published: Berlin, Heidelberg : Springer Berlin Heidelberg, 2005.
Series:Springer Series in Advanced Microelectronics, 16
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ΒΚΠ - Πατρα: ALFd

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