Nanofabrication Techniques and Principles /

Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with n...

Πλήρης περιγραφή

Λεπτομέρειες βιβλιογραφικής εγγραφής
Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
Άλλοι συγγραφείς: Stepanova, Maria (Επιμελητής έκδοσης), Dew, Steven (Επιμελητής έκδοσης)
Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: Vienna : Springer Vienna, 2012.
Θέματα:
Διαθέσιμο Online:Full Text via HEAL-Link
LEADER 03073nam a22005175i 4500
001 978-3-7091-0424-8
003 DE-He213
005 20151125191234.0
007 cr nn 008mamaa
008 111107s2012 au | s |||| 0|eng d
020 |a 9783709104248  |9 978-3-7091-0424-8 
024 7 |a 10.1007/978-3-7091-0424-8  |2 doi 
040 |d GrThAP 
050 4 |a T174.7 
050 4 |a TA418.9.N35 
072 7 |a TBN  |2 bicssc 
072 7 |a TEC027000  |2 bisacsh 
072 7 |a SCI050000  |2 bisacsh 
082 0 4 |a 620.115  |2 23 
245 1 0 |a Nanofabrication  |h [electronic resource] :  |b Techniques and Principles /  |c edited by Maria Stepanova, Steven Dew. 
264 1 |a Vienna :  |b Springer Vienna,  |c 2012. 
300 |a VIII, 344 p.  |b online resource. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
347 |a text file  |b PDF  |2 rda 
505 0 |a 1 Introduction -- Directions in Nanofabrication -- 2 Nanolithography -- Fundamentals of Electron Beam Exposure and Development -- Simulation of Electron Beam Exposure and Resist Processing for Nano-Patterning -- Helium Ion Lithography -- Nanoimprint Technologies -- 3 Deposition at the Nanoscale -- Atomic Layer Deposition for Nanotechnology -- Surface Functionalization in the Nanoscale Domain -- Nanostructures Based on Self-Assembly of Block Copolymers -- Epitaxial Growth of Metals on Semiconductors Via Electrodeposition -- 4 Nanoscale Etching and Patterning -- Chemical Mechanical Polish for Nanotechnology -- Deposition, Milling, and Etching with a Focused Helium Ion Beam -- Laser Nanopatterning -- Templating and Pattern Transfer Using Anodized Nanoporous Alumina/Titania.-. 
520 |a Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years. 
650 0 |a Materials science. 
650 0 |a Nanochemistry. 
650 0 |a Lasers. 
650 0 |a Photonics. 
650 0 |a Nanotechnology. 
650 1 4 |a Materials Science. 
650 2 4 |a Nanotechnology. 
650 2 4 |a Nanochemistry. 
650 2 4 |a Nanotechnology and Microengineering. 
650 2 4 |a Laser Technology, Photonics. 
700 1 |a Stepanova, Maria.  |e editor. 
700 1 |a Dew, Steven.  |e editor. 
710 2 |a SpringerLink (Online service) 
773 0 |t Springer eBooks 
776 0 8 |i Printed edition:  |z 9783709104231 
856 4 0 |u http://dx.doi.org/10.1007/978-3-7091-0424-8  |z Full Text via HEAL-Link 
912 |a ZDB-2-CMS 
950 |a Chemistry and Materials Science (Springer-11644)