Multiscale Modeling in Epitaxial Growth Mini-Workshop at Mathematisches Forschungsinstitut Oberwolfach January 18–24, 2004 /

Epitaxy is a very active area of theoretical research since several years. It is experimentally well-explored and technologically relevant for thin film growth. Recently powerful numerical techniques in combination with a deep understanding of the physical and chemical phenomena during the growth pr...

Πλήρης περιγραφή

Λεπτομέρειες βιβλιογραφικής εγγραφής
Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
Άλλοι συγγραφείς: Voigt, Axel (Επιμελητής έκδοσης)
Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: Basel : Birkhäuser Basel, 2005.
Σειρά:ISNM International Series of Numerical Mathematics ; 149
Θέματα:
Διαθέσιμο Online:Full Text via HEAL-Link
Πίνακας περιεχομένων:
  • Atomistic Models
  • Lattice Gas Models and Kinetic Monte Carlo Simulations of Epitaxial Growth
  • Cluster Diffusion and Island Formation on fcc(111) Metal Surfaces Studied by Atomic Scale Computer Simulations
  • A Multiscale Study of the Epitaxial CVD of Si from Chlorosilanes
  • Off-lattice Kinetic Monte Carlo Simulations of Strained Heteroepitaxial Growth
  • Quasicontinuum Monte Carlo Simulation of Multilayer Surface Growth
  • Step Flow Models
  • to Step Dynamics and Step Instabilities
  • A Finite Element Framework for Burton-Cabrera-Frank Equation
  • Edge Diffusion in Phase-Field Models for Epitaxial Growth
  • Discretisation and Numerical Tests of a Diffuse-Interface Model with Ehrlich-Schwoebel Barrier
  • Islands in the Stream: Electromigration-Driven Shape Evolution with Crystal Anisotropy
  • Simulation of Ostwald Ripening in Homoepitaxy
  • Continuum Models
  • Continuum Models for Surface Growth
  • Configurational Continuum Modelling of Crystalline Surface Evolution
  • On Level Set Formulations for Anisotropic Mean Curvature Flow and Surface Diffusion.