Samukawa, S. (2014). Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System. Springer Japan : Imprint: Springer.
Chicago Style (17th ed.) CitationSamukawa, Seiji. Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System. Tokyo: Springer Japan : Imprint: Springer, 2014.
MLA (8th ed.) CitationSamukawa, Seiji. Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System. Springer Japan : Imprint: Springer, 2014.
Warning: These citations may not always be 100% accurate.