Poly-SiGe for MEMS-above-CMOS Sensors
Polycrystalline SiGe has emerged as a promising MEMS (Microelectromechanical Systems) structural material since it provides the desired mechanical properties at lower temperatures compared to poly-Si, allowing the direct post-processing on top of CMOS. This CMOS-MEMS monolithic integration can lead...
| Κύριοι συγγραφείς: | , , |
|---|---|
| Συγγραφή απο Οργανισμό/Αρχή: | |
| Μορφή: | Ηλεκτρονική πηγή Ηλ. βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2014.
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| Σειρά: | Springer Series in Advanced Microelectronics,
44 |
| Θέματα: | |
| Διαθέσιμο Online: | Full Text via HEAL-Link |
Πίνακας περιεχομένων:
- Acknowledgements
- Abstract
- Symbols and Abbreviations
- Introduction
- Poly-SiGe As Piezoresistive Material
- Design of a Poly-SiGe Piezoresistive Pressure Sensor
- The Pressure Sensor Fabrication Process
- Sealing of Surface Micromachined Poly-SiGe Cavities
- Characterization of Poly-SiGe pressure sensors
- CMOS Integrated Poly-SiGe Piezoresistive Pressure Sensor
- Conclusions And Future Work
- Appendix A
- Appendix B
- Appendix C
- Appendix D.