Wang, G., & Wang, G. (2019). Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (1st ed. 2019.). Springer Singapore : Imprint: Springer. https://doi.org/10.1007/978-981-15-0046-6
Παραπομπή σε μορφή Chicago (17η εκδ.)Wang, Guilei, και Guilei Wang. Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 Nm CMOS Technology Node and Beyond. 1st ed. 2019. Singapore: Springer Singapore : Imprint: Springer, 2019. https://doi.org/10.1007/978-981-15-0046-6.
Παραπομπή σε μορφή MLA (8th εκδ.)Wang, Guilei, και Guilei Wang. Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 Nm CMOS Technology Node and Beyond. 1st ed. 2019. Springer Singapore : Imprint: Springer, 2019. https://doi.org/10.1007/978-981-15-0046-6.
