1007743.pdf
This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their f...
| Language: | English |
|---|---|
| Published: |
CRC Press
2020
|
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