64743.pdf
In conventional atomic layer deposition (ALD), precursors are exposed sequentially to a substrate through short pulses while kept physically separated by intermediate purge steps. Spatial ALD (SALD) is a variation of ALD in which precursors are continuously supplied in different locations and kept a...
| Γλώσσα: | English |
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| Έκδοση: |
InTechOpen
2021
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