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03718nam a2200601 4500 |
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ocn773300979 |
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OCoLC |
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20170124072418.6 |
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m o d |
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120119s2011 gw ob 001 0 eng d |
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|a DG1
|b eng
|e pn
|c DG1
|d YDXCP
|d OCLCO
|d OCLCQ
|d OCLCF
|d OCLCA
|d EBLCP
|d MEU
|d N$T
|d DEBSZ
|d E7B
|d IDEBK
|d OCLCQ
|d COO
|d OCLCQ
|d GrThAP
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|a 849922525
|a 908041352
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|a 9783527639915
|q (electronic bk.)
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|q (electronic bk.)
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|a 9783527639939
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|z 9783527327973
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1 |
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|a AU@
|b 000049641677
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|a DEBSZ
|b 431658609
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| 029 |
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|a GBVCP
|b 790035332
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|a NZ1
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| 029 |
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|a NZ1
|b 15340704
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| 035 |
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|a (OCoLC)773300979
|z (OCoLC)849922525
|z (OCoLC)908041352
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| 037 |
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|a 10.1002/9783527639915
|b Wiley InterScience
|n http://www3.interscience.wiley.com
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| 050 |
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4 |
|a TS695
|b .A86 2011
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| 072 |
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|a TEC
|x 009070
|2 bisacsh
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| 082 |
0 |
4 |
|a 621.38152
|2 22
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| 049 |
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|a MAIN
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0 |
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|a Atomic layer deposition of nanostructured materials /
|c edited by Nicola Pinna, Mato Knez.
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| 264 |
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1 |
|a Weinheim :
|b Wiley-VCH ;
|c 2011.
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| 264 |
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2 |
|a Chichester :
|b John Wiley [distributor],
|c 2011.
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| 300 |
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|a 1 online resource (1 volume)
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| 336 |
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|a text
|b txt
|2 rdacontent
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| 337 |
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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| 505 |
0 |
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|a Front Matter -- Introduction to ALD. Theoretical Modeling of ALD Processes / Charles B Musgrave -- Step Coverage in ALD / Sovan Kumar Panda, Hyunjung Shin -- Precursors for ALD Processes / Matti Putkonen -- Sol₆Gel Chemistry and Atomic Layer Deposition / Guylhaine Clavel, Catherine Marichy, Nicola Pinna -- Molecular Layer Deposition of Hybrid Organic₆Inorganic Films / Steven M George, Byunghoon Yoon, Robert A Hall, Aziz I Abdulagatov, Zachary M Gibbs, Younghee Lee, Dragos Seghete, Byoung H Lee -- Low-Temperature Atomic Layer Deposition / Jens Meyer, Thomas Riedl -- Plasma Atomic Layer Deposition / Erwin Kessels, Harald Profijt, Stephen Potts, Richard van de Sanden -- Nanostructures by ALD. Atomic Layer Deposition for Microelectronic Applications / Cheol Seong Hwang -- Nanopatterning by Area-Selective Atomic Layer Deposition / Han-Bo-Ram Lee, Stacey F Bent -- Coatings on High Aspect Ratio Structures / Jeffrey W Elam -- Coatings of Nanoparticles and Nanowires / Hong Jin Fan, Kornelius Nielsch -- Atomic Layer Deposition on Soft Materials / Gregory N Parsons -- Application of ALD to Biomaterials and Biocompatible Coatings / Mato Knez -- Coating of Carbon Nanotubes / Catherine Marichy, Andrea Pucci, Marc-Georg Willinger, Nicola Pinna -- Inverse Opal Photonics / Davy P Gaillot, Christopher J Summers -- Nanolaminates / Adriana V Szeghalmi, Mato Knez -- Challenges in Atomic Layer Deposition / Markku Leskel̃ -- Index.
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|a Print version record.
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| 504 |
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|a Includes bibliographical references and index.
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| 650 |
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|a Chemical vapor deposition.
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| 650 |
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|a Nanostructured materials.
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| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Mechanical.
|2 bisacsh
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| 650 |
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7 |
|a Chemical vapor deposition.
|2 fast
|0 (OCoLC)fst00853229
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| 650 |
|
7 |
|a Nanostructured materials.
|2 fast
|0 (OCoLC)fst01032630
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| 655 |
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4 |
|a Electronic books.
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| 700 |
1 |
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|a Pinna, Nicola.
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| 700 |
1 |
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|a Knez, Mato.
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| 710 |
2 |
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|a Wiley InterScience (Online service)
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| 776 |
0 |
8 |
|i Print version:
|t Atomic layer deposition of nanostructured materials.
|d Weinheim : Wiley-VCH ; Chichester : John Wiley [distributor], 2011
|z 9783527327973
|w (OCoLC)751804738
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| 856 |
4 |
0 |
|u https://doi.org/10.1002/9783527639915
|z Full Text via HEAL-Link
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| 994 |
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|a 92
|b DG1
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