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04649nam a2200721 4500 |
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ocn778448543 |
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OCoLC |
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20170124070041.2 |
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m o d |
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cr cnu---unuuu |
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120228s2012 nju ob 001 0 eng d |
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|a N$T
|b eng
|e pn
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|d EBLCP
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|d OCLCQ
|d IDEBK
|d OCLCQ
|d AU@
|d OCLCO
|d OCLCF
|d OCLCQ
|d RECBK
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|a 779617142
|a 817082211
|a 819896613
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|a 9781119963240
|q (electronic bk.)
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|a 1119963249
|q (electronic bk.)
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|a 9781119963677
|q (electronic bk.)
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|a 1119963672
|q (electronic bk.)
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|a 1280590807
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|a 9781280590801
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|z 9780470662540
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|a 9786613620637
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|a (OCoLC)778448543
|z (OCoLC)779617142
|z (OCoLC)817082211
|z (OCoLC)819896613
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037 |
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|a 10.1002/9781119963677
|b Wiley InterScience
|n http://www3.interscience.wiley.com
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|a TK7874.53
|b .A39 2012eb
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|a COM
|x 036000
|2 bisacsh
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|a TEC
|x 008030
|2 bisacsh
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|a TEC
|x 008050
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|a 621.39/5
|2 23
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|a MAIN
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|a Advanced interconnects for ULSI technology /
|c [edited by] Mikhail Baklanov, Paul S. Ho, Ehrenfried Zschech.
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264 |
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|a Hoboken, NJ :
|b Wiley,
|c 2012.
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300 |
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|a 1 online resource
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336 |
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|a text
|b txt
|2 rdacontent
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337 |
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a "This book presents an in-depth overview of present status, novel developments and new materials and approaches for advanced interconnect technology"--
|c Provided by publisher.
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|a Includes bibliographical references and index.
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|a Print version record.
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|a Front Matter -- Colour Plates -- Section I: Low-. Low- Materials: Recent Advances / Geraud Dubois, Willi Volksen -- Ultra-Low- by CVD: Deposition and Curing / Vincent Jousseaume, Aziz Zenasni, Olivier Gourhant, Laurent Favennec, Mikhail R Baklanov -- Plasma Processing of Low- Dielectrics / Hualiang Shi, Denis Shamiryan, Jean-Fraṅois de Marneffe, Huai Huang, Paul S Ho, Mikhail R Baklanov -- Wet Clean Applications in Porous Low- Patterning Processes / Quoc Toan Le, Guy Vereecke, Herbert Struyf, Els Kesters, Mikhail R Baklanov -- Section II: Conductive Layers and Barriers. Copper Electroplating for On-Chip Metallization / Valery M Dubin -- Diffusion Barriers / Michael Hecker, Rene Hubner -- Section III: Integration and Reliability. Process Integration of Interconnects / Sridhar Balakrishnan, Ruth Brain, Larry Zhao -- Chemical Mechanical Planarization for Cu₆Low- Integration / Gautam Banerjee -- Scaling and Microstructure Effects on Electromigration Reliability for Cu Interconnects / Chao-Kun Hu, Rene Hubner, Lijuan Zhang, Meike Hauschildt, Paul S Ho -- Mechanical Reliability of Low- Dielectrics / Kris Vanstreels, Han Li, Joost J Vlassak -- Electrical Breakdown in Advanced Interconnect Dielectrics / Ennis T Ogawa, Oliver Aubel -- Section IV: New Approaches. 3D Interconnect Technology / John U Knickerbocker, Lay Wai Kong, Sven Niese, Alain Diebold, Ehrenfried Zschech -- Carbon Nanotubes for Interconnects / Mizuhisa Nihei, Motonobu Sato, Akio Kawabata, Shintaro Sato, Yuji Awano -- Optical Interconnects / Wim Bogaerts -- Wireless Interchip Interconnects / Takamaro Kikkawa -- Index.
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|a Interconnects (Integrated circuit technology)
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|a Integrated circuits
|x Ultra large scale integration.
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4 |
|a Integrated circuits
|x Ultra large scale integration.
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650 |
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4 |
|a Interconnects (Integrated circuit technology)
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650 |
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7 |
|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Circuits
|x VLSI & ULSI.
|2 bisacsh
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650 |
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7 |
|a COMPUTERS
|x Logic Design.
|2 bisacsh
|
650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Circuits
|x Logic.
|2 bisacsh
|
650 |
|
7 |
|a Integrated circuits
|x Ultra large scale integration.
|2 fast
|0 (OCoLC)fst00975596
|
650 |
|
7 |
|a Interconnects (Integrated circuit technology)
|2 fast
|0 (OCoLC)fst00976051
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655 |
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4 |
|a Electronic books.
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700 |
1 |
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|a Baklanov, Mikhail.
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700 |
1 |
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|a Ho, P. S.
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700 |
1 |
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|a Zschech, Ehrenfried.
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773 |
0 |
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|t EBL
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776 |
0 |
8 |
|i Print version:
|t Advanced interconnects for ULSI technology.
|d Hoboken, NJ : Wiley, 2012
|z 9780470662540
|w (DLC) 2011038787
|w (OCoLC)757478544
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856 |
4 |
0 |
|u https://doi.org/10.1002/9781119963677
|z Full Text via HEAL-Link
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994 |
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|a 92
|b DG1
|