Advanced interconnects for ULSI technology /

"This book presents an in-depth overview of present status, novel developments and new materials and approaches for advanced interconnect technology"--

Λεπτομέρειες βιβλιογραφικής εγγραφής
Άλλοι συγγραφείς: Baklanov, Mikhail, Ho, P. S., Zschech, Ehrenfried
Μορφή: Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: Hoboken, NJ : Wiley, 2012.
Θέματα:
Διαθέσιμο Online:Full Text via HEAL-Link
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049 |a MAIN 
245 0 0 |a Advanced interconnects for ULSI technology /  |c [edited by] Mikhail Baklanov, Paul S. Ho, Ehrenfried Zschech. 
264 1 |a Hoboken, NJ :  |b Wiley,  |c 2012. 
300 |a 1 online resource 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
520 |a "This book presents an in-depth overview of present status, novel developments and new materials and approaches for advanced interconnect technology"--  |c Provided by publisher. 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a Front Matter -- Colour Plates -- Section I: Low-. Low- Materials: Recent Advances / Geraud Dubois, Willi Volksen -- Ultra-Low- by CVD: Deposition and Curing / Vincent Jousseaume, Aziz Zenasni, Olivier Gourhant, Laurent Favennec, Mikhail R Baklanov -- Plasma Processing of Low- Dielectrics / Hualiang Shi, Denis Shamiryan, Jean-Fraṅois de Marneffe, Huai Huang, Paul S Ho, Mikhail R Baklanov -- Wet Clean Applications in Porous Low- Patterning Processes / Quoc Toan Le, Guy Vereecke, Herbert Struyf, Els Kesters, Mikhail R Baklanov -- Section II: Conductive Layers and Barriers. Copper Electroplating for On-Chip Metallization / Valery M Dubin -- Diffusion Barriers / Michael Hecker, Rene Hubner -- Section III: Integration and Reliability. Process Integration of Interconnects / Sridhar Balakrishnan, Ruth Brain, Larry Zhao -- Chemical Mechanical Planarization for Cu₆Low- Integration / Gautam Banerjee -- Scaling and Microstructure Effects on Electromigration Reliability for Cu Interconnects / Chao-Kun Hu, Rene Hubner, Lijuan Zhang, Meike Hauschildt, Paul S Ho -- Mechanical Reliability of Low- Dielectrics / Kris Vanstreels, Han Li, Joost J Vlassak -- Electrical Breakdown in Advanced Interconnect Dielectrics / Ennis T Ogawa, Oliver Aubel -- Section IV: New Approaches. 3D Interconnect Technology / John U Knickerbocker, Lay Wai Kong, Sven Niese, Alain Diebold, Ehrenfried Zschech -- Carbon Nanotubes for Interconnects / Mizuhisa Nihei, Motonobu Sato, Akio Kawabata, Shintaro Sato, Yuji Awano -- Optical Interconnects / Wim Bogaerts -- Wireless Interchip Interconnects / Takamaro Kikkawa -- Index. 
650 0 |a Interconnects (Integrated circuit technology) 
650 0 |a Integrated circuits  |x Ultra large scale integration. 
650 4 |a Integrated circuits  |x Ultra large scale integration. 
650 4 |a Interconnects (Integrated circuit technology) 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Circuits  |x VLSI & ULSI.  |2 bisacsh 
650 7 |a COMPUTERS  |x Logic Design.  |2 bisacsh 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Circuits  |x Logic.  |2 bisacsh 
650 7 |a Integrated circuits  |x Ultra large scale integration.  |2 fast  |0 (OCoLC)fst00975596 
650 7 |a Interconnects (Integrated circuit technology)  |2 fast  |0 (OCoLC)fst00976051 
655 4 |a Electronic books. 
700 1 |a Baklanov, Mikhail. 
700 1 |a Ho, P. S. 
700 1 |a Zschech, Ehrenfried. 
773 0 |t EBL 
776 0 8 |i Print version:  |t Advanced interconnects for ULSI technology.  |d Hoboken, NJ : Wiley, 2012  |z 9780470662540  |w (DLC) 2011038787  |w (OCoLC)757478544 
856 4 0 |u https://doi.org/10.1002/9781119963677  |z Full Text via HEAL-Link 
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