High-k gate dielectrics for CMOS technology /
"A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over...
| Άλλοι συγγραφείς: | , |
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| Μορφή: | Ηλ. βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
Weinheim :
Wiley-VCH,
2012.
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| Θέματα: | |
| Διαθέσιμο Online: | Full Text via HEAL-Link |
| Περίληψη: | "A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Topics covered include downscaling limits of current transistor designs, deposition techniques for high-k dielectric materials, electrical characterization of the resulting devices, and an outlook towards future transistor stacking technology. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering."-- |
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| Φυσική περιγραφή: | 1 online resource (xxxi, 558 pages) : illustrations (some color) |
| Βιβλιογραφία: | Includes bibliographical references and index. |
| ISBN: | 9783527646340 9783527646371 352764637X 9783527646364 3527646361 9783527646357 3527646353 3527646345 3527330321 9783527330324 9781280881435 1280881437 |
| DOI: | 10.1002/9783527646340 |
