Transmission electron microscopy in micro-nanoelectronics /

Today, the availability of bright and highly coherent electron sources and sensitive detectors has radically changed the type and quality of the information which can be obtained by transmission electron microscopy (TEM). TEMs are now present in large numbers not only in academia, but also in indust...

Πλήρης περιγραφή

Λεπτομέρειες βιβλιογραφικής εγγραφής
Άλλοι συγγραφείς: Claverie, A. (Alain)
Μορφή: Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: London : ISTE, Ltd. ; [2013]
Hoboken : Wiley, [2013]
Σειρά:ISTE.
Θέματα:
Διαθέσιμο Online:Full Text via HEAL-Link
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245 0 0 |a Transmission electron microscopy in micro-nanoelectronics /  |c edited by Alain Claverie. 
264 1 |a London :  |b ISTE, Ltd. ;  |c [2013] 
264 1 |a Hoboken :  |b Wiley,  |c [2013] 
264 4 |c ©2013 
300 |a 1 online resource (259 pages). 
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520 |a Today, the availability of bright and highly coherent electron sources and sensitive detectors has radically changed the type and quality of the information which can be obtained by transmission electron microscopy (TEM). TEMs are now present in large numbers not only in academia, but also in industrial research centers and fabs. This book presents in a simple and practical way the new quantitative techniques based on TEM which have recently been invented or developed to address most of the main challenging issues scientists and process engineers have to face. 
505 0 |a Active Dopant Profiling in the TEM by Off-Axis Electron Holography / David Cooper -- Dopant Distribution Quantitative Analysis Using STEM-EELS/EDX Spectroscopy Techniques / Roland Pantel, Germain Servanton -- Quantitative Strain Measurement in Advanced Devices: A Comparison Between Convergent Beam Electron Diffraction and Nanobeam Diffraction / Laurent Clement, Dominique Delille -- Dark-Field Electron Holography for Strain Mapping / Martin Hytch [and others] -- Magnetic mapping using electron holography / Etienne Snoeck, Christophe Gatel -- Interdiffusion and chemical reaction at interfaces by TEM/EELS / Sylvie Schamm-Chardon -- Characterization of process-induced defects / Nikolay Cherkashin, Alain Claverie -- In situ characterization methods in transmission electron microscopy / Aurelein Massebouef -- Specimen preparation for semiconductor analysis / David Cooper, Gerard Ben Assayag. 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
650 0 |a Transmission electron microscopy. 
650 0 |a Semiconductors. 
650 4 |a Micro-nanoelectronics. 
650 4 |a Nanoparticles. 
650 4 |a Nanotechnology. 
650 4 |a Transmission electron microscopy. 
650 4 |a Nanoelectronics  |x Microscopy. 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Semiconductors.  |2 bisacsh 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Solid State.  |2 bisacsh 
650 7 |a Semiconductors.  |2 fast  |0 (OCoLC)fst01112198 
650 7 |a Transmission electron microscopy.  |2 fast  |0 (OCoLC)fst01154860 
650 7 |a Transmission electron microscopy.  |2 local 
650 7 |a Nanoelectronics / Microscopy.  |2 local 
655 4 |a Electronic books. 
700 1 |a Claverie, A.  |q (Alain) 
776 0 8 |i Print version:  |a Claverie, Alain.  |t Transmission Electron Microscopy in Micro-nanoelectronics.  |d London : Wiley, ©2013  |z 9781848213678 
830 0 |a ISTE. 
856 4 0 |u https://doi.org/10.1002/9781118579022  |z Full Text via HEAL-Link 
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