Principles of physical vapor deposition of thin films
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered...
| Κύριος συγγραφέας: | |
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| Συγγραφή απο Οργανισμό/Αρχή: | |
| Μορφή: | Ηλεκτρονική πηγή Βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
Amsterdam Boston London
Elsevier
2006
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| Έκδοση: | 1st ed |
| Θέματα: | |
| Διαθέσιμο Online: | An electronic book accessible through the World Wide Web; click for information An electronic book accessible through the World Wide Web; click for information Publisher description |
| Περίληψη: | The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text |
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| Φυσική περιγραφή: | xi, 1160 σ. εικ. 25 εκ |
| Βιβλιογραφία: | Περιέχει βιβλιογραφικές παραπομπές και ευρετήριο |
| ISBN: | 9780080446998 008044699X |
