Principles of physical vapor deposition of thin films

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered...

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Bibliographic Details
Main Author: SreeHarsha, K. S
Corporate Author: ScienceDirect (Online service)
Format: Electronic Book
Language:English
Published: Amsterdam Boston London Elsevier 2006
Edition:1st ed
Subjects:
Online Access:An electronic book accessible through the World Wide Web; click for information
An electronic book accessible through the World Wide Web; click for information
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Summary:The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text
Physical Description:xi, 1160 σ. εικ. 25 εκ
Bibliography:Περιέχει βιβλιογραφικές παραπομπές και ευρετήριο
ISBN:9780080446998
008044699X