Principles of physical vapor deposition of thin films
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered...
Κύριος συγγραφέας: | SreeHarsha, K. S |
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Συγγραφή απο Οργανισμό/Αρχή: | ScienceDirect (Online service) |
Μορφή: | Ηλεκτρονική πηγή Βιβλίο |
Γλώσσα: | English |
Έκδοση: |
Amsterdam Boston London
Elsevier
2006
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Έκδοση: | 1st ed |
Θέματα: | |
Διαθέσιμο Online: | An electronic book accessible through the World Wide Web; click for information An electronic book accessible through the World Wide Web; click for information Publisher description |
Παρόμοια τεκμήρια
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Materials science of thin films deposition and structure
ανά: Ohring, Milton 1936-
Έκδοση: (2002) -
Waveguide spectroscopy of thin films
ανά: Khomchenko, Alexander V
Έκδοση: (2005) -
Materials surface processing by directed energy techniques
Έκδοση: (2006) -
Aqueous systems at elevated temperatures and pressures physical chemistry in water, steam and hydrothermal solutions
Έκδοση: (2004) -
Steam tables thermodynamic properties of water including vapor, liquid, and solid phases (international system of units-S.I.)
ανά: Keenan, Joseph H.
Έκδοση: (1978)