Design for Manufacturability and Yield for Nano-Scale CMOS

• Κύριοι συγγραφείς: Chiang, Charles C. (Συγγραφέας), Kawa, Jamil (Συγγραφέας)
• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Dordrecht : Springer Netherlands, 2007.
• Σειρά: Series on Integrated Circuits and Systems,
• Θέματα: Engineering.; Microprocessors.; Software engineering.; Computer-aided engineering.; Electronics.; Microelectronics.; Electronic circuits.; Nanotechnology.; Circuits and Systems.; Electronics and Microelectronics, Instrumentation.; Computer-Aided Engineering (CAD, CAE) and Design.; Processor Architectures.; Software Engineering/Programming and Operating Systems.

As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...