Design for Manufacturability and Yield for Nano-Scale CMOS
As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...
| Main Authors: | , |
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| Corporate Author: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Dordrecht :
Springer Netherlands,
2007.
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| Series: | Series on Integrated Circuits and Systems,
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| Subjects: | |
| Online Access: | Full Text via HEAL-Link |
