Design for Manufacturability and Yield for Nano-Scale CMOS

As we approach the 32 nm CMOS technology node the design and manufacturing communities are dealing with a lithography system that has to print circuit artifacts that are significantly less than half the wavelength of the light source used, with new materials, with tighter pitches, and higher aspect...

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Bibliographic Details
Main Authors: Chiang, Charles C. (Author), Kawa, Jamil (Author)
Corporate Author: SpringerLink (Online service)
Format: Electronic eBook
Language:English
Published: Dordrecht : Springer Netherlands, 2007.
Series:Series on Integrated Circuits and Systems,
Subjects:
Online Access:Full Text via HEAL-Link

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ΒΚΠ - Πατρα: ALFd

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Call Number: 330.01 BAU
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ΒΚΠ - Πατρα: BSC

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Call Number: 330.01 BAU
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