Reproducible Research in Pattern Recognition Second International Workshop, RRPR 2018, Beijing, China, August 20, 2018, Revised Selected Papers /

• Corporate Author: SpringerLink (Online service)
• Other Authors: Kerautret, Bertrand (Editor, http://id.loc.gov/vocabulary/relators/edt), Colom, Miguel (Editor, http://id.loc.gov/vocabulary/relators/edt), Lopresti, Daniel (Editor, http://id.loc.gov/vocabulary/relators/edt), Monasse, Pascal (Editor, http://id.loc.gov/vocabulary/relators/edt), Talbot, Hugues (Editor, http://id.loc.gov/vocabulary/relators/edt)
• Format: Electronic eBook
• Language: English
• Published: Cham : Springer International Publishing : Imprint: Springer, 2019.
• Edition: 1st ed. 2019.
• Series: Image Processing, Computer Vision, Pattern Recognition, and Graphics ; 11455
• Subjects: Pattern recognition.; Optical data processing.; Software engineering.; Artificial intelligence.; Pattern Recognition.; Image Processing and Computer Vision.; Software Engineering.; Artificial Intelligence.

This book constitutes the thoroughly refereed post-workshop proceedings of the Second International Workshop on Reproducible Research in Pattern Recognition, RRPR 2018, in Beijing, China in August 2018. The 8 revised full papers, presented together 6 short papers, were carefully reviewed and selecte...