Long-Term Reliability of Nanometer VLSI Systems Modeling, Analysis and Optimization /

• Main Authors: Tan, Sheldon (Author, http://id.loc.gov/vocabulary/relators/aut), Tahoori, Mehdi (http://id.loc.gov/vocabulary/relators/aut), Kim, Taeyoung (http://id.loc.gov/vocabulary/relators/aut), Wang, Shengcheng (http://id.loc.gov/vocabulary/relators/aut), Sun, Zeyu (http://id.loc.gov/vocabulary/relators/aut), Kiamehr, Saman (http://id.loc.gov/vocabulary/relators/aut)
• Corporate Author: SpringerLink (Online service)
• Format: Electronic eBook
• Language: English
• Published: Cham : Springer International Publishing : Imprint: Springer, 2019.
• Edition: 1st ed. 2019.
• Subjects: Electronic circuits.; Microprocessors.; Electronic Circuits and Devices.; Circuits and Systems.; Processor Architectures.

This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent de...