Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means...
Main Author: | |
---|---|
Corporate Author: | |
Format: | Electronic eBook |
Language: | English |
Published: |
Cham :
Springer International Publishing : Imprint: Springer,
2017.
|
Series: | Springer Theses, Recognizing Outstanding Ph.D. Research,
|
Subjects: | |
Online Access: | Full Text via HEAL-Link |
Table of Contents:
- Introduction
- Fabrication Techniques
- Characterization Techniques
- Thermal Oxidation of Gd2o3
- Plasma Oxidation of Gd2o3 and Sc2o3
- Gadolinium Scandate
- Interface Scavenging
- Gd2o3 on Inp Substrates
- Conclusions and Future Work.