Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

• Main Authors: Shim, Seongbo (Author, http://id.loc.gov/vocabulary/relators/aut), Shin, Youngsoo (http://id.loc.gov/vocabulary/relators/aut)
• Corporate Author: SpringerLink (Online service)
• Format: Electronic eBook
• Language: English
• Published: Cham : Springer International Publishing : Imprint: Springer, 2018.
• Edition: 1st ed. 2018.
• Series: NanoScience and Technology,
• Subjects: Nanotechnology.; Electronic circuits.; Optical materials.; Electronic materials.; Nanoscale science.; Nanoscience.; Nanostructures.; Semiconductors.; Nanotechnology and Microengineering.; Circuits and Systems.; Optical and Electronic Materials.; Nanoscale Science and Technology.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...

Table of Contents:

• Introduction
• DSAL Manufacturability
• Placement Optimization for DSAL
• Placement Optimization for MP-DSAL Compliant Layout
• Redundant Via Insertion for DSAL.