Ion Implantation and Synthesis of Materials

• Κύριοι συγγραφείς: Nastasi, Michael (Συγγραφέας), Mayer, James W. (Συγγραφέας)
• Συγγραφή απο Οργανισμό/Αρχή: SpringerLink (Online service)
• Μορφή: Ηλεκτρονική πηγή Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: Berlin, Heidelberg : Springer Berlin Heidelberg, 2006.
• Θέματα: Physics.; Physical chemistry.; Particle acceleration.; Condensed matter.; Optical materials.; Electronic materials.; Materials science.; Particle Acceleration and Detection, Beam Physics.; Condensed Matter Physics.; Optical and Electronic Materials.; Characterization and Evaluation of Materials.; Physical Chemistry.

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implant...