Strain-Induced Effects in Advanced MOSFETs

Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor fil...

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Bibliographic Details
Main Author: Sverdlov, Viktor (Author)
Corporate Author: SpringerLink (Online service)
Format: Electronic eBook
Language:English
Published: Vienna : Springer Vienna : Imprint: Springer, 2011.
Series:Computational Microelectronics,
Subjects:
Online Access:Full Text via HEAL-Link
Description
Summary:Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given.
Physical Description:XIV, 252 p. 101 illus. online resource.
ISBN:9783709103821
ISSN:0179-0307