Variation-Aware Advanced CMOS Devices and SRAM
This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications o...
| Main Author: | |
|---|---|
| Corporate Author: | |
| Format: | Electronic eBook |
| Language: | English |
| Published: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2016.
|
| Series: | Springer Series in Advanced Microelectronics,
56 |
| Subjects: | |
| Online Access: | Full Text via HEAL-Link |
Internet
Full Text via HEAL-LinkΒΚΠ - Πατρα: ALFd
| Call Number: |
330.01 BAU |
|---|---|
| Copy 1 | Available |
ΒΚΠ - Πατρα: BSC
| Call Number: |
330.01 BAU |
|---|---|
| Copy 2 | Available |
| Copy 3 | Available |