Variation-Aware Advanced CMOS Devices and SRAM
This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications o...
Κύριος συγγραφέας: | Shin, Changhwan (Συγγραφέας) |
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Συγγραφή απο Οργανισμό/Αρχή: | SpringerLink (Online service) |
Μορφή: | Ηλεκτρονική πηγή Ηλ. βιβλίο |
Γλώσσα: | English |
Έκδοση: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2016.
|
Σειρά: | Springer Series in Advanced Microelectronics,
56 |
Θέματα: | |
Διαθέσιμο Online: | Full Text via HEAL-Link |
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