Variation-Aware Advanced CMOS Devices and SRAM
This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications o...
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Format: | Electronic eBook |
Language: | English |
Published: |
Dordrecht :
Springer Netherlands : Imprint: Springer,
2016.
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Series: | Springer Series in Advanced Microelectronics,
56 |
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Online Access: | Full Text via HEAL-Link |
Internet
Full Text via HEAL-LinkΒΚΠ - Πατρα: ALFd
Call Number: |
330.01 BAU |
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Copy 1 | Available |
ΒΚΠ - Πατρα: BSC
Call Number: |
330.01 BAU |
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Copy 2 | Available |
Copy 3 | Available |