Plasma enhanced chemical vapor deposition of silicon thin films and materials' characterization

• Main Author: Αλεξίου, Ιωάννης
• Other Authors: Ματαράς, Δημήτριος
• Format: Thesis
• Language: English
• Published: 2018
• Subjects: Dust particles; Microcrystalline hydrognated silicon; PECVD; Μικροκρυσταλλικό υδρογονωμένο πυρίτιο; Χημική εναπόθεση ατμών υποβοηθούμενη με πλάσμα; 621.381 045

Amorphous (a-Si:H) and microcrystalline (μc-Si:H) hydrogenated silicon, have attracted particular attention during the last decades due to their application in optoelectronic devices (transistors, thin film solar cells, TFTs etc.). These materials are produced via Plasma Enhanced Chemical Vapor Depo...