Plasma enhanced chemical vapor deposition of silicon thin films and materials' characterization
Amorphous (a-Si:H) and microcrystalline (μc-Si:H) hydrogenated silicon, have attracted particular attention during the last decades due to their application in optoelectronic devices (transistors, thin film solar cells, TFTs etc.). These materials are produced via Plasma Enhanced Chemical Vapor Depo...
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| Άλλοι συγγραφείς: | |
| Μορφή: | Thesis |
| Γλώσσα: | English |
| Έκδοση: |
2018
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| Διαθέσιμο Online: | http://hdl.handle.net/10889/11094 |
