Silicon technologies : ion implantation and thermal treatment /

• Άλλοι συγγραφείς: Baudrant, Annie
• Μορφή: Ηλ. βιβλίο
• Γλώσσα: English
• Έκδοση: London : ISTE ; 2011.; Hoboken, NJ : Wiley, 2011.
• Θέματα: Semiconductor doping.; Ion implantation.; Semiconductors > Heat treatment.; TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.; TECHNOLOGY & ENGINEERING > Electronics > Solid State.; Semiconductors / Heat treatment.; Electronic books.

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.