Silicon technologies : ion implantation and thermal treatment /

Silicon technologies : ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Bibliographic Details
Other Authors: Baudrant, Annie
Format: eBook
Language:English
Published: London : ISTE ; 2011.
Hoboken, NJ : Wiley, 2011.
Subjects:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
Semiconductors / Heat treatment.
Electronic books.
Online Access:Full Text via HEAL-Link
Description
Summary:The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Item Description:Title from PDF title page (viewed on Feb. 28, 2013).
Physical Description:1 online resource : illustrations
Bibliography:Includes bibliographical references and index.
ISBN:9781118601044
1118601041
9781118601112
1118601114
9781118601143
1118601149
DOI:10.1002/9781118601044

Similar Items