Silicon technologies : ion implantation and thermal treatment /

Silicon technologies : ion implantation and thermal treatment /

The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.

Λεπτομέρειες βιβλιογραφικής εγγραφής
Άλλοι συγγραφείς: Baudrant, Annie
Μορφή: Ηλ. βιβλίο
Γλώσσα:English
Έκδοση: London : ISTE ; 2011.
Hoboken, NJ : Wiley, 2011.
Θέματα:
Semiconductor doping.
Ion implantation.
Semiconductors > Heat treatment.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
Semiconductors / Heat treatment.
Electronic books.
Διαθέσιμο Online:Full Text via HEAL-Link
Περιγραφή
Περίληψη:The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
Περιγραφή τεκμηρίου:Title from PDF title page (viewed on Feb. 28, 2013).
Φυσική περιγραφή:1 online resource : illustrations
Βιβλιογραφία:Includes bibliographical references and index.
ISBN:9781118601044
1118601041
9781118601112
1118601114
9781118601143
1118601149
DOI:10.1002/9781118601044

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