Silicon technologies : ion implantation and thermal treatment /
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
| Άλλοι συγγραφείς: | |
|---|---|
| Μορφή: | Ηλ. βιβλίο |
| Γλώσσα: | English |
| Έκδοση: |
London :
ISTE ;
2011.
Hoboken, NJ : Wiley, 2011. |
| Θέματα: | |
| Διαθέσιμο Online: | Full Text via HEAL-Link |
| Περίληψη: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
|---|---|
| Περιγραφή τεκμηρίου: | Title from PDF title page (viewed on Feb. 28, 2013). |
| Φυσική περιγραφή: | 1 online resource : illustrations |
| Βιβλιογραφία: | Includes bibliographical references and index. |
| ISBN: | 9781118601044 1118601041 9781118601112 1118601114 9781118601143 1118601149 |
| DOI: | 10.1002/9781118601044 |
